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authorJaeun Choi <jaeun12.choi@samsung.com>2014-11-13 10:04:00 +0900
committerJean-Philippe Andre <jp.andre@samsung.com>2015-01-07 15:06:02 +0900
commit9af60b1b04a877c70f78ced137a6886b403b25f6 (patch)
treed8144f050622330aa65b7b7f0e4cf597a90b20eb /src/lib/evas/include/evas_common_private.h
parenta86f799542b8663a5a5e2f02ebc6b77efecdb29f (diff)
Evas masking: Use alpha mask in SW engine draw functions
Work done by Jaeun Choi, rebased & squashed by jpeg. This commit introduces changes to the low-level draw functions of the SW engine considering the existence of an alpha mask image. Features: - Font masking (TEXT, TEXTBLOCK), - Rectangle masking, - Image masking (all image scaling functions should be handled). The mask image itself is not yet set in the draw context (see following commits). @feature Signed-off-by: Jean-Philippe Andre <jp.andre@samsung.com>
Diffstat (limited to 'src/lib/evas/include/evas_common_private.h')
-rw-r--r--src/lib/evas/include/evas_common_private.h2
1 files changed, 2 insertions, 0 deletions
diff --git a/src/lib/evas/include/evas_common_private.h b/src/lib/evas/include/evas_common_private.h
index e9a25f474c..8f01bf0536 100644
--- a/src/lib/evas/include/evas_common_private.h
+++ b/src/lib/evas/include/evas_common_private.h
@@ -700,6 +700,8 @@ struct _RGBA_Draw_Context
700 } col; 700 } col;
701 struct RGBA_Draw_Context_clip { 701 struct RGBA_Draw_Context_clip {
702 int x, y, w, h; 702 int x, y, w, h;
703 void *mask;
704 int mask_x, mask_y;
703 Eina_Bool use : 1; 705 Eina_Bool use : 1;
704 } clip; 706 } clip;
705 Cutout_Rects cutout; 707 Cutout_Rects cutout;