Work done by Jaeun Choi, rebased & squashed by jpeg.
This commit introduces changes to the low-level draw functions
of the SW engine considering the existence of an alpha mask image.
Features:
- Font masking (TEXT, TEXTBLOCK),
- Rectangle masking,
- Image masking (all image scaling functions should be handled).
The mask image itself is not yet set in the draw context (see
following commits).
@feature
Signed-off-by: Jean-Philippe Andre <jp.andre@samsung.com>
I've tested make -j 3 install and it works nicely
I've tested expedite with software and opengl xlib,
and it works. Not tested other engines, so please
report any problems (engines or other) on the ML.
TODO: examples and tests, I'll add them later
ISSUE: Eina_Unicode size check. It indirectly depends on
eina_config.h, which is created at the end of the
configure script. So its size is always 0. I don't
know how that size is used, so I can't do a lot,
for now.
SVN revision: 78895
Jaeun Choi
Leandro Pereira
Vincent Torri