Commit Graph

5 Commits

Author SHA1 Message Date
Jaeun Choi 9af60b1b04 Evas masking: Use alpha mask in SW engine draw functions
Work done by Jaeun Choi, rebased & squashed by jpeg.

This commit introduces changes to the low-level draw functions
of the SW engine considering the existence of an alpha mask image.

Features:
- Font masking (TEXT, TEXTBLOCK),
- Rectangle masking,
- Image masking (all image scaling functions should be handled).

The mask image itself is not yet set in the draw context (see
following commits).

@feature

Signed-off-by: Jean-Philippe Andre <jp.andre@samsung.com>
2015-01-07 15:06:02 +09:00
Carsten Haitzler 8389e3e6a9 evas - rectangle custouts - fix possible leak coverity found
this fixes CID 1039924
2014-08-25 12:42:56 +09:00
Leandro Pereira b51ab5fc02 evas/common: Prepare soil to land rect drawing code for threaded render
SVN revision: 81186
2012-12-17 21:28:32 +00:00
Paulo Alcantara 7dd926fbae evas/rectangle: Refactor common code for rectangle drawing
This patch refactors common code for rectangle draws - so that it can be
used by other engines and *threaded* X11.

Signed-off-by: Paulo Alcantara <pcacjr@profusion.mobi>

Patch by: Paulo Alcantara <pcacjr@profusion.mobi>



SVN revision: 79785
2012-11-28 19:17:00 +00:00
Vincent Torri c15e9c6575 merge: and now Evas
I've tested make -j 3 install and it works nicely

I've tested expedite with software and opengl xlib,
and it works. Not tested other engines, so please
report any problems (engines or other) on the ML.

TODO: examples and tests, I'll add them later

ISSUE: Eina_Unicode size check. It indirectly depends on
       eina_config.h, which is created at the end of the
       configure script. So its size is always 0. I don't
       know how that size is used, so I can't do a lot,
       for now.


SVN revision: 78895
2012-11-04 11:51:42 +00:00